Structural Behavior Of rf Magnetron Sputtered Cupric Oxide (CuO) Films

Authors

Ali Nadhim Khilkhal, Department of Physics, College of Educatio, University of Al-Qadisiyah, Diwaniyah, IraqFollow
Abdalhussain A. Khadayeir, Department of Physics, College of Educatio, University of Al-Qadisiyah, Diwaniyah, IraqFollow

Document Type

Article

Abstract

In this paper a CuO thin film, has been deposited using RF sputtering technique, then the thin film has been characterized by XRD, result obtained showed that strongest peak was 48.6503 degree, and FWHM was 0.145 degree, while lattice constant was 4.65 Aº, and the average grain size was 62.78 nm. While AFM analysis showed that the increasing of another four samples temperature led to increase of roughness average from (3.77 to 15.7) nm, root mean square from (4.66 to 18.8) nm and ten points height from (22.6 to 52.6) at 250,300,350 and 400 C respectively. On the other hand granularity cumulation distribution charts showed average diameter has varied from (57.42, to 135.41) nm with grain numbers per line ( 364, to 135) respectively.

Keywords

Cupric Oxide, RF Magnetron Sputtering, Thin films

Recommended Citation

Khilkhal, Ali Nadhim and Khadayeir, Abdalhussain A. (2020) "Structural Behavior Of rf Magnetron Sputtered Cupric Oxide (CuO) Films," Al-Qadisiyah Journal of Pure Science: Vol. 25 : No. 2 , Article 11.
Available at: https://doi.org/10.29350/2411-3514.1200

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